{"id":2502,"productCode":"POSIO2125003N-1","chemicalCode":"SiO2","name":"Silicon Dioxide","customName":null,"otherNames":"","formula":"SiO2","purity":99.9,"form":"PO","size":"-1250 mesh (7.25 mic aps) approx","composition":"","description":"","productionMethod":"","bulkAvailable":null,"productionStatus":"Stock","hazmat":null,"status":null,"repackage":false,"priceBase":"76","quantityBase":"kg","bulkAvailability":true,"inProduction":"","factoryCode":"752, 753","publicComments":"inred MOQ to apply","privateComments":"Lot no: 752-071310","chemicalCodeLetters":null,"image":null,"sizeData":"{\"formSize\":\"57\",\"size_form\":[{\"text\":\"-\"},{\"input_value\":\"1250\"},{\"select\":{\"value\":\"mesh\",\"options\":[{\"value\":\"mesh\",\"text\":\"mesh\"},{\"value\":\"micron\",\"text\":\"micron\"},{\"value\":\"nm\",\"text\":\"nm\"}]}},{\"text\":\"(\"},{\"input_value\":\"7.25\"},{\"text\":\"mic aps)\"},{\"select\":{\"value\":\"approx\",\"options\":[{\"value\":\"\",\"text\":\"\"},{\"value\":\"approx\",\"text\":\"approx.\"}]}}]}","isLocked":true,"isSearchable":true,"storedLocation":null,"chemicalId":1018,"old_chem_id":null,"vendorId":null,"createdAt":"2021-12-06T20:18:22.000Z","updatedAt":"2021-12-06T20:18:22.000Z","deleted":false,"deletedAt":null,"userChangedById":null,"hts":null,"Chemical":{"id":1018,"formula":"SiO2","productLetters":"SIO2","name":"Silicon Dioxide","otherNames":"Silica, Glass, Quartz, Silicon(IV) Oxide, 7631-86-9, 60676-86-0","cas":"14808-60-7","einecs":"238-878-4","hazmat":"Not hazardous for transportation","data":"","publicComments":"

Silicon dioxide is a foundational material in semiconductor manufacturing, where it used as an insulation, passivation, and interlayer dielectric in integrated devices.1 In optical coating systems, SiO2 is used in thin-film coating stacks to control reflection and transmission in ultraviolet, visible, and infrared components.2,3 SiO2 thin films are widely deposited by thermal oxidation, chemical vapor deposition, and physical vapor deposition, enabling compatibility with both microelectronics and optical fabrication workflows.4 Beyond electronics and optics, high-purity silicon dioxide is widely used in specialty inorganic applications, including crystal growth environments, ceramic processing, and chemically stable barrier layers.5

","privateComments":"Silicon dioxide is used to is used for production of other materials, as well as high temperature, pharmaceutical, food industry, cosmetic, semiconductor, communication and construction applications. It is used to produce glass, stoneware, ceramics, porcelain, abrasives, earthenware, rubber. It is used for high temperature applications such as thermal insulation due to its heat resistance. Silicon dioxide fibers are used to make fabric that serves as thermal protection. The construction industry is the biggest consumer of silicon dioxide, using it to make Portland cement concrete and for processes such as sand casting. It is used by the pharmaceutical industry when producing tablets, for DNA extraction and RNA extraction. It is an abrasive in toothpastes for the removal and prevention of plaque buildup. It is used in food manufactures as a anticaking or hygroscopic agent in food products such as powder creamers and spices. It is also used as a fining agent in the production of various drinks. Silica dioxide is also used to produce optical fibers which are utilized in telecommunication applications.\r\n\r\nGranular applications: Utilized for sand casting","specialNotes":"","specialNotesProduct":false,"sds":"public/sds/SiO2.pdf","smiles":"","inchi":"","inchiKey":"","molecularWeight":"","iupac":"","eccn":"","hts":"","createdAt":"2021-05-14T14:28:03.000Z","updatedAt":"2026-01-22T15:06:37.851Z","deleted":false,"deletedAt":null,"userChangedById":19,"customContent":"","displayFormula":"","bottomText":"

References:

  1. Sze, S. M.; Ng, K. K., Physics of Semiconductor Devices, 3rd ed., Wiley, 2007.
  2. Macleod, H. A., Thin Film Optical Filters, 4th ed., CRC Press, 2010.
  3. Kaiser, N.; Pulker, H. K.,Optical Interference Coatings, Springer, 2003.
  4. Ohring, M., Materials Science of Thin Films, 2nd ed., Academic Press, 2002.
  5. Shelby, J.E. Introduction to Glass and Technology, 2nd ed., Royal Society of Chemistry, Cambridge, 2005.
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