High-purity hafnium metal is used in nuclear technology, where it serves as a control material due to its strong ability to absorb neutrons.1 In aerospace and other extreme temperature applications, hafnium is added to refractory metal and superalloy systems to improve stability under harsh operating conditions.2 Hafnium is used in optical coating and semiconductor fabrication, where it serves as a metal source for deposited layers and as a precursor for hafnium oxide and related compound films formed during deposition.3,4 This material is commonly supplied in forms suitable for evaporation and physical vapor deposition processes used in thin-film and coating production.4
","privateComments":"Hafnium is a transition metal used in filaments, electrodes, semiconductors, gate insulators, neutron absorption in control rods, and nuclear power plants. It has mechanical properties and corrosion-resistance that make it useful in alloys, pressurized water reactors, military reactors, and naval reactors. Due to its heat resistance and affinity to oxygen and nitrogen it is used as a scavenger for oxygen and nitrogen in glass-filled and incandescent lamps. Radioactive isotopes of hafnium have a large half-life and are used to trace the evolution of Earth’s mantle.","specialNotes":"","specialNotesProduct":false,"sds":"public/sds/Hf.pdf","smiles":"","inchi":"","inchiKey":"","molecularWeight":"","iupac":"","eccn":"","hts":"","atomicNumber":72,"atomicWeight":"178.49 u","meltingPoint":"2233 °C","boilingPoint":"4603 °C","density":"13.31 g/cm³","crystalStructure":"Hexagonal close-packed","colorAppearance":"Steel gray","thermalConductivity":"23.0 W/(m·K)","electricalResistivity":"33.1 μΩ·cm","coefficientOfExpansion":"5.9 µm/(m·K)","electronegativity":"1.3","neutronCrossSection":"104 barns","electronConfiguration":"[Xe] 4f14 5d2 6s2","createdAt":"2023-05-08T18:30:57.000Z","updatedAt":"2026-04-28T21:07:44.924Z","deleted":false,"deletedAt":null,"userChangedById":19,"customContent":"","displayFormula":"","bottomText":"References:
1. International Atomic Energy Agency (IAEA) Advances Control Assembly Materials for Water Reactors. IAEA-TECDOC-813.
2. Lütjering, G.; Williams, J. C. Titanium, 2nd ed., Springer, 2007.
3. Ohring, M., Materials Science of Thin Films, 2nd ed., Academic Press, 2002.
4. Mattox, D. M. Handbook of Physical Vapor Deposition (PVD) Processing, 2nd ed., Elsevier, 2010.
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